Lithographic apparatus and lithographic apparatus cleaning method

ABSTRACT

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.

This application is a continuation of co-pending U.S. patent applicationSer. No. 11/437,876, filed May 22, 2006, now allowed, the entirecontents of the foregoing application incorporated herein by reference.

FIELD

The present invention relates to a lithographic apparatus and a methodfor cleaning a lithographic apparatus.

BACKGROUND

A lithographic apparatus is a machine that applies a desired patternonto a substrate, usually onto a target portion of the substrate. Alithographic apparatus can be used, for example, in the manufacture ofintegrated circuits (ICs). In that instance, a patterning device, whichis alternatively referred to as a mask or a reticle, may be used togenerate a circuit pattern to be formed on an individual layer of theIC. This pattern can be transferred onto a target portion (e.g.comprising part of, one, or several dies) on a substrate (e.g. a siliconwafer). Transfer of the pattern is typically via imaging onto a layer ofradiation-sensitive material (resist) provided on the substrate. Ingeneral, a single substrate will contain a network of adjacent targetportions that are successively patterned. Known lithographic apparatusinclude so-called steppers, in which each target portion is irradiatedby exposing an entire pattern onto the target portion at one time, andso-called scanners, in which each target portion is irradiated byscanning the pattern through a radiation beam in a given direction (the“scanning”-direction) while synchronously scanning the substrateparallel or anti-parallel to this direction. It is also possible totransfer the pattern from the patterning device to the substrate byimprinting the pattern onto the substrate.

It has been proposed to immerse the substrate in the lithographicprojection apparatus in a liquid having a relatively high refractiveindex, e.g. water, so as to fill a space between the final element ofthe projection system and the substrate. The point of this is to enableimaging of smaller features since the exposure radiation will have ashorter wavelength in the liquid. (The effect of the liquid may also beregarded as increasing the effective NA of the system and alsoincreasing the depth of focus.) Other immersion liquids have beenproposed, including water with solid particles (e.g. quartz) suspendedtherein.

However, submersing the substrate or substrate and substrate table in abath of liquid (see, for example, U.S. Pat. No. 4,509,852) means thatthere is a large body of liquid that must be accelerated during ascanning exposure. This requires additional or more powerful motors andturbulence in the liquid may lead to undesirable and unpredictableeffects.

One of the solutions proposed is for a liquid supply system to provideliquid on only a localized area of the substrate and in between thefinal element of the projection system and the substrate using a liquidconfinement system (the substrate generally has a larger surface areathan the final element of the projection system). One way which has beenproposed to arrange for this is disclosed in PCT patent applicationpublication no. WO 99/49504. As illustrated in FIGS. 2 and 3, liquid issupplied by at least one inlet IN onto the substrate, preferably alongthe direction of movement of the substrate relative to the finalelement, and is removed by at least one outlet OUT after having passedunder the projection system. That is, as the substrate is scannedbeneath the element in a −X direction, liquid is supplied at the +X sideof the element and taken up at the −X side. FIG. 2 shows the arrangementschematically in which liquid is supplied via inlet IN and is taken upon the other side of the element by outlet OUT which is connected to alow pressure source. In the illustration of FIG. 2 the liquid issupplied along the direction of movement of the substrate relative tothe final element, though this does not need to be the case. Variousorientations and numbers of in- and out-lets positioned around the finalelement are possible, one example is illustrated in FIG. 3 in which foursets of an inlet with an outlet on either side are provided in a regularpattern around the final element.

A further immersion lithography solution with a localized liquid supplysystem is shown in FIG. 4. Liquid is supplied by two groove inlets IN oneither side of the projection system PL and is removed by a plurality ofdiscrete outlets OUT arranged radially outwardly of the inlets IN. Theinlets IN and OUT can be arranged in a plate with a hole in its centerand through which the projection beam is projected. Liquid is suppliedby one groove inlet IN on one side of the projection system PL andremoved by a plurality of discrete outlets OUT on the other side of theprojection system PL, causing a flow of a thin film of liquid betweenthe projection system PL and the substrate W. The choice of whichcombination of inlet IN and outlets OUT to use can depend on thedirection of movement of the substrate W (the other combination of inletIN and outlets OUT being inactive).

In European patent application publication no. EP 1420300 and UnitedStates patent application publication no. US 2004-0136494, each herebyincorporated in their entirety by reference, the idea of a twin or dualstage immersion lithography apparatus is disclosed. Such an apparatus isprovided with two tables for supporting a substrate. Levelingmeasurements are carried out with a table at a first position, withoutimmersion liquid, and exposure is carried out with a table at a secondposition, where immersion liquid is present. Alternatively, theapparatus has only one table.

Immersion liquid may lift debris or particles (e.g. left over from themanufacturing process) from parts of the lithographic apparatus and/orsubstrates or erode components so as to introduce particles. This debrismay then be left behind on the substrate after imaging or may interferewith the imaging while in suspension in the liquid between theprojection system and the substrate. Thus, the issue of contaminationshould be addressed in an immersion lithographic apparatus.

SUMMARY

It is desirable, for example, to provide a lithographic apparatus whichcan easily and effectively be cleaned as well as to provide a method foreffectively cleaning an immersion lithographic apparatus.

According to an aspect of the invention, there is provided An immersionlithographic projection apparatus, comprising: a substrate tableconstructed and arranged to hold a substrate; a projection systemconfigured to project a patterned beam of radiation onto the substrate;a megasonic transducer configured to clean a surface; and a liquidsupply system constructed and arranged to supply liquid between themegasonic transducer and the surface to be cleaned.

According to an aspect of the invention, there is provided An immersionlithographic projection apparatus, comprising: a substrate tableconstructed and arranged to hold a substrate; a projection systemconfigured to project a patterned beam of radiation onto the substrate;a megasonic transducer configured to clean a surface, the megasonictransducer being moveable relative to the surface such that, in acleaning mode, a direct straight path through liquid exists between themegasonic transducer and the surface; and a liquid supply systemconfigured to provide liquid between the transducer and the surface.

According to an aspect of the invention, there is provided a method ofcleaning a surface of an immersion lithographic projection apparatus,comprising: covering at least a part of the surface to be cleaned inliquid; and introducing megasonic waves into the liquid.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of exampleonly, with reference to the accompanying schematic drawings in whichcorresponding reference symbols indicate corresponding parts, and inwhich:

FIG. 1 depicts a lithographic apparatus according to an embodiment ofthe invention;

FIGS. 2 and 3 depict a liquid supply system for use in a lithographicprojection apparatus;

FIG. 4 depicts a another liquid supply system for use in a lithographicprojection apparatus;

FIG. 5 depicts, in cross-section, another liquid supply system for usein an immersion lithographic apparatus;

FIG. 6 illustrates, in cross-section, a first embodiment of the presentinvention to clean a substrate table;

FIG. 7 illustrates, in cross-section, a second embodiment of the presentinvention to clean a liquid supply system; and

FIG. 8 illustrates, in cross-section, a third embodiment of theinvention to clean a substrate table.

DETAILED DESCRIPTION

FIG. 1 schematically depicts a lithographic apparatus according to oneembodiment of the invention. The apparatus comprises:

an illumination system (illuminator) IL configured to condition aradiation beam B (e.g. UV radiation or DUV radiation);

a support structure (e.g. a mask table) MT constructed to support apatterning device (e.g. a mask) MA and connected to a first positionerPM configured to accurately position the patterning device in accordancewith certain parameters;

a substrate table (e.g. a wafer table) WT constructed to hold asubstrate (e.g. a resist-coated wafer) W and connected to a secondpositioner PW configured to accurately position the substrate inaccordance with certain parameters; and

a projection system (e.g. a refractive projection lens system) PSconfigured to project a pattern imparted to the radiation beam B bypatterning device MA onto a target portion C (e.g. comprising one ormore dies) of the substrate W.

The illumination system may include various types of optical components,such as refractive, reflective, magnetic, electromagnetic, electrostaticor other types of optical components, or any combination thereof, fordirecting, shaping, or controlling radiation.

The support structure holds the patterning device in a manner thatdepends on the orientation of the patterning device, the design of thelithographic apparatus, and other conditions, such as for examplewhether or not the patterning device is held in a vacuum environment.The support structure can use mechanical, vacuum, electrostatic or otherclamping techniques to hold the patterning device. The support structuremay be a frame or a table, for example, which may be fixed or movable asrequired. The support structure may ensure that the patterning device isat a desired position, for example with respect to the projectionsystem. Any use of the terms “reticle” or “mask” herein may beconsidered synonymous with the more general term “patterning device.”

The term “patterning device” used herein should be broadly interpretedas referring to any device that can be used to impart a radiation beamwith a pattern in its cross-section such as to create a pattern in atarget portion of the substrate. It should be noted that the patternimparted to the radiation beam may not exactly correspond to the desiredpattern in the target portion of the substrate, for example if thepattern includes phase-shifting features or so called assist features.Generally, the pattern imparted to the radiation beam will correspond toa particular functional layer in a device being created in the targetportion, such as an integrated circuit.

The patterning device may be transmissive or reflective. Examples ofpatterning devices include masks, programmable mirror arrays, andprogrammable LCD panels. Masks are well known in lithography, andinclude mask types such as binary, alternating phase-shift, andattenuated phase-shift, as well as various hybrid mask types. An exampleof a programmable mirror array employs a matrix arrangement of smallmirrors, each of which can be individually tilted so as to reflect anincoming radiation beam in different directions. The tilted mirrorsimpart a pattern in a radiation beam which is reflected by the mirrormatrix.

The term “projection system” used herein should be broadly interpretedas encompassing any type of projection system, including refractive,reflective, catadioptric, magnetic, electromagnetic and electrostaticoptical systems, or any combination thereof, as appropriate for theexposure radiation being used, or for other factors such as the use ofan immersion liquid or the use of a vacuum. Any use of the term“projection lens” herein may be considered as synonymous with the moregeneral term “projection system”.

As here depicted, the apparatus is of a transmissive type (e.g.employing a transmissive mask). Alternatively, the apparatus may be of areflective type (e.g. employing a programmable mirror array of a type asreferred to above, or employing a reflective mask).

The lithographic apparatus may be of a type having two (dual stage) ormore substrate tables (and/or two or more support structures). In such“multiple stage” machines the additional tables may be used in parallel,or preparatory steps may be carried out on one or more tables while oneor more other tables are being used for exposure.

Referring to FIG. 1, the illuminator IL receives a radiation beam from aradiation source SO. The source and the lithographic apparatus may beseparate entities, for example when the source is an excimer laser. Insuch cases, the source is not considered to form part of thelithographic apparatus and the radiation beam is passed from the sourceSO to the illuminator IL with the aid of a beam delivery system BDcomprising, for example, suitable directing mirrors and/or a beamexpander. In other cases the source may be an integral part of thelithographic apparatus, for example when the source is a mercury lamp.The source SO and the illuminator IL, together with the beam deliverysystem BD if required, may be referred to as a radiation system.

The illuminator IL may comprise an adjuster AD for adjusting the angularintensity distribution of the radiation beam. Generally, at least theouter and/or inner radial extent (commonly referred to as σ-outer andσ-inner, respectively) of the intensity distribution in a pupil plane ofthe illuminator can be adjusted. In addition, the illuminator IL maycomprise various other components, such as an integrator IN and acondenser CO. The illuminator may be used to condition the radiationbeam, to have a desired uniformity and intensity distribution in itscross-section.

The radiation beam B is incident on the patterning device (e.g., mask)MA, which is held on the support structure (e.g., mask table) MT, and ispatterned by the patterning device. Having traversed the patterningdevice MA, the radiation beam B passes through the projection system PS,which focuses the beam onto a target portion C of the substrate W. Withthe aid of the second positioner PW and position sensor IF (e.g. aninterferometric device, linear encoder or capacitive sensor), thesubstrate table WT can be moved accurately, e.g. so as to positiondifferent target portions C in the path of the radiation beam B.Similarly, the first positioner PM and another position sensor (which isnot explicitly depicted in FIG. 1) can be used to accurately positionthe patterning device MA with respect to the path of the radiation beamB, e.g. after mechanical retrieval from a mask library, or during ascan. In general, movement of the support structure MT may be realizedwith the aid of a long-stroke module (coarse positioning) and ashort-stroke module (fine positioning), which form part of the firstpositioner PM. Similarly, movement of the substrate table WT may berealized using a long-stroke module and a short-stroke module, whichform part of the second positioner PW. In the case of a stepper (asopposed to a scanner) the support structure MT may be connected to ashort-stroke actuator only, or may be fixed. Patterning device MA andsubstrate W may be aligned using patterning device alignment marks M1,M2 and substrate alignment marks P1, P2. Although the substratealignment marks as illustrated occupy dedicated target portions, theymay be located in spaces between target portions (these are known asscribe-lane alignment marks). Similarly, in situations in which morethan one die is provided on the patterning device MA, the patterningdevice alignment marks may be located between the dies.

The depicted apparatus could be used in at least one of the followingmodes:

1. In step mode, the support structure MT and the substrate table WT arekept essentially stationary, while an entire pattern imparted to theradiation beam is projected onto a target portion C at one time (i.e. asingle static exposure). The substrate table WT is then shifted in the Xand/or Y direction so that a different target portion C can be exposed.In step mode, the maximum size of the exposure field limits the size ofthe target portion C imaged in a single static exposure.

2. In scan mode, the support structure MT and the substrate table WT arescanned synchronously while a pattern imparted to the radiation beam isprojected onto a target portion C (i.e. a single dynamic exposure). Thevelocity and direction of the substrate table WT relative to the supportstructure MT may be determined by the (de-)magnification and imagereversal characteristics of the projection system PS. In scan mode, themaximum size of the exposure field limits the width (in the non-scanningdirection) of the target portion in a single dynamic exposure, whereasthe length of the scanning motion determines the height (in the scanningdirection) of the target portion.

3. In another mode, the support structure MT is kept essentiallystationary holding a programmable patterning device, and the substratetable WT is moved or scanned while a pattern imparted to the radiationbeam is projected onto a target portion C. In this mode, generally apulsed radiation source is employed and the programmable patterningdevice is updated as required after each movement of the substrate tableWT or in between successive radiation pulses during a scan. This mode ofoperation can be readily applied to maskless lithography that utilizesprogrammable patterning device, such as a programmable mirror array of atype as referred to above.

Combinations and/or variations on the above described modes of use orentirely different modes of use may also be employed.

Another immersion lithography solution with a localized liquid supplysystem solution which has been proposed is to provide the liquid supplysystem with a barrier member which extends along at least a part of aboundary of the space between the final element of the projection systemand the substrate table. Such a solution is illustrated in FIG. 5. Thebarrier member is substantially stationary relative to the projectionsystem in the XY plane though there may be some relative movement in theZ direction (in the direction of the optical axis). In an embodiment, aseal is formed between the barrier member and the surface of thesubstrate and may be a contactless seal such as a gas seal.

The barrier member 12 at least partly contains liquid in the space 11between a final element of the projection system PS and the substrate W.A contactless seal 16 to the substrate may be formed around the imagefield of the projection system so that liquid is confined within thespace between the substrate surface and the final element of theprojection system. The space is at least partly formed by the barriermember 12 positioned below and surrounding the final element of theprojection system PS. Liquid is brought into the space below theprojection system and within the barrier member 12 by liquid inlet 13and may be removed by liquid outlet 13. The barrier member 12 may extenda little above the final element of the projection system and the liquidlevel rises above the final element so that a buffer of liquid isprovided. The barrier member 12 has an inner periphery that at the upperend, in an embodiment, closely conforms to the shape of the projectionsystem or the final element thereof and may, e.g., be round. At thebottom, the inner periphery closely conforms to the shape of the imagefield, e.g., rectangular though this need not be the case.

The liquid is contained in the space 11 by a gas seal 16 which, duringuse, is formed between the bottom of the barrier member 12 and thesurface of the substrate W. The gas seal is formed by gas, e.g. air orsynthetic air but, in an embodiment, N₂ or another inert gas, providedunder pressure via inlet 15 to the gap between barrier member 12 andsubstrate and extracted via outlet 14. The overpressure on the gas inlet15, vacuum level on the outlet 14 and geometry of the gap are arrangedso that there is a high-velocity gas flow inwards that confines theliquid. Those inlets/outlets may be annular grooves which surround thespace 11 and the flow of gas 16 is effective to contain the liquid inthe space 11. Such a system is disclosed in United States patentapplication publication no. US 2004-0207824, hereby incorporated in itsentirety by reference.

As noted above, an immersion lithographic apparatus is one in which asubstrate is imaged through liquid. That is, an immersion liquid isprovided between a final element of the projection system PS and thesubstrate. This arrangement may pose one or more particular problems. Inparticular, the liquid should be confined in the apparatus and also theliquid should be kept as free as possible of foreign object particleswhich may cause defects during imaging and/or by being left on thesubstrate surface after imaging and prior to downstream processing.Sometimes the immersion liquid includes particles in suspensiondeliberately.

One or more embodiments of the present invention addresses the problemof foreign object particles by providing an apparatus and a method toclean an immersion lithographic projection apparatus in which a cleaningliquid is applied to the surface to be cleaned and megasonic waves areintroduced into the liquid to clean the surface. The cleaning liquid mayor may not be the same as the immersion liquid. It could, for example,be ultra pure water.

Compared to ultrasonic waves, megasonic waves produce cavitation bubbles(which implode or vibrate) which are very small and therefore may govery close to the surface to be cleaned. However, there is a limit tothe amount of energy which may be introduced into the liquid usingmegasonics. Generally whereas ultrasonic energy may be introduced into aliquid anywhere and will be distributed throughout the liquid, megasonicenergy is only locally high and must therefore be directed directly tothe surface to be cleaned. That is, a direct path (line ofsight/straight) must be present between the transducer introducing themegasonic waves and the surface to be cleaned. The whole length of thatpath should be filled with liquid.

Megasonic frequencies are generally regarded to be between 750 kHz to 3MHz. For the present purposes frequencies of above about 750 kHz, above1 MHz or above 1.5 MHz are used.

A stagnant boundary layer in the cleaning fluid near the surface of anobject to be cleaned becomes thinner as frequency of the introducedsonic energy is increased. At megasonic frequencies cleaning is partlyaccomplished by acoustic streaming with high velocity pressure waves inthe cleaning fluid as well as bubble vibration and, to a lesser extentcavitation and bubble bursting.

At megasonic frequencies, particles of less than 0.5 μm in diameter maybe removed without damage to the surface being cleaned. As mentionedabove, there must be a clear path from the transducer to the surfacebeing cleaned (line of sight). In order to further increase the cleaningefficiency, gas may be dissolved into the liquid to promote cavitation(bubble formation). Suitable gases are nitrogen, carbon dioxide oroxygen but other gases may also be suitable. The use of a surfactant inthe liquid can further enhance cleaning efficiency.

Objects which one might want to clean in an immersion lithographicapparatus include, but not limited to, the substrate table WT whichsupports the substrate W (its top surface), the final element of theprojection system PS which is immersed in immersion liquid duringimaging and parts of the liquid confinement system (for example thoseillustrated in FIGS. 2-5) which provides liquid between the finalelement of the projection system PS and the substrate W during imaging.

In an embodiment, a liquid supply system is provided to provide liquidbetween a megasonic transducer and the surface to be cleaned. In theembodiment, the liquid supply system provides a flow of liquid so thatliquid is removed as the surface is cleaned such that particles removedfrom the surface are carried away. One suitable liquid is water in anultra pure form. However, other types of liquid may be suitable.Furthermore, an addition to the liquid such as a surfactant as mentionedabove may also have an advantage. Other cleaning liquids arewater/hydrogen peroxide, water/ethanol, water/ammonia or water/acetonemixtures, for example. Other chemicals which may be useful as anaddition include TMAH and SC-1 or SC-2.

One reason for introducing gas (or some solvents) into the liquid isthat this promotes stable cavitation. This results in stable bubblesbeing formed in the liquid. These bubbles are then vibrated by themegasonic waves which results in cleaning which is likely to do lessdamage to the surface being cleaned than so called transient cavitationwhich is cavitation where a solvent evaporates into a bubble and thenimplodes or collapses. These violent implosions may lead to damage ofthe surface and are typically seen at ultrasonic frequencies and areless significant at megasonic frequencies where the bubbles producedtend to be smaller than those produced at ultrasonic frequencies.However, as noted above, the megasonic waves need to be supplied in lineof sight of the surface they are to clean.

A process time up to 100 seconds may lead to a particle removalefficiency of up to 100% at a frequency of about 1 MHz. If the acousticfrequency exceeds much more than 3 MHz the particle removal efficiencyis dramatically decreased over a frequency of just above 1 MHz. Theintroduction of gas into the liquid has a major effect on the particleremoval efficiency. Removal of 34 nm diameter SiO₂ particles mayincrease from zero removal efficiency to 30% removal efficiency with theintroduction of oxygen at a level of 20 ppm into the liquid. Thus, a gasconcentration of above about 5 ppm can be useful.

Temperature may also be important and a balance should be drawn betweenfaster reaction time at a high temperature (say 55° C.) over less gasbeing dissolved at a high temperature.

There is also an effect of the pH of the liquid. At low pH, there aremany H⁺ ions in the liquid which results in a positive surface charge.Similarly, at high pH the liquid contains many OH⁻ ions which results ina negative surface charge. Therefore ensuring that the pH of the liquidis distant from pH 7 ensures that re-deposition of particles after theyhave been removed does not occur. Moreover, the electrostatic repulsionbetween the particle and the surface when both are charged equally(either positively or negatively) assists in lifting the particle fromthe surface.

The power of the transducer should be between 0.2 and 5 W/cm², theirradiation distance should be between 5 and 20 mm and a cleaning timeshould be between 10 and 90 seconds. For the acoustic waves from themegasonic transducer to travel a direct path to the surface to becleaned from the megasonic transducer, several designs are proposed toclean different parts of the immersion lithographic apparatus.

A first embodiment is illustrated in FIG. 6 which may be used, forinstance, to clean a top surface of a substrate table WT. In thisembodiment the liquid supply system comprises a barrier member 12 whichsurrounds a transducer 20. The barrier member 12 could be similar tothat of the liquid confinement system of FIG. 5 in that it comprises agas seal device 14, 15 to create a seal between the bottom of thebarrier member 12 and the top surface of the substrate table WT using aflow of gas 16. The transducer 20 which fits inside the barrier member12 may thereby be positioned very close to the surface of the substratetable WT. This is an advantage because the transducer 20 should be quitesmall in order to fit inside the barrier member 12 and therefore shouldbe positioned relatively close to the top surface of the substrate tableWT being cleaned (because it has low power). In an embodiment, themegasonic transducer 20 is less than 1.5 mm or less than 1.6 mm awayfrom the surface it is cleaning. A flow of liquid is provided across thebarrier member 12 and the bottom of the transducer 20 is covered inliquid.

The substrate table WT and/or the barrier member 12 and transducer 20are moved relative to the other so that all of the top surface of thesubstrate table WT may be cleaned. The cleaning could take place withinthe lithographic apparatus in an automated way or could be carried outby hand by passing the barrier member 12 and transducer 20 over the topsurface of the substrate table WT by hand.

If the cleaning process is automated, one way of arranging for this isto provide the barrier member 12 and transducer 20 arrangement to bemoveable from a stationary store position to a (stationary) cleanposition and to move the substrate table WT relative to the transducer20 when the transducer is in the (stationary) clean position. Thesubstrate table WT may need to be moved in the Z axis prior toactivation of the liquid supply system of the cleaning device. Once thegas flow 16 has been created the barrier member 12 is supplied withliquid and the substrate table WT is moved in the X-Y plane so that thesurfaces which are desired to be cleaned can be cleaned.

FIG. 7 illustrates a second embodiment which is used in order to clean aliquid confinement system LCS, such as one illustrated in FIGS. 2-5,which is positioned around the final element of the projection systemPS. In FIG. 7 a liquid confinement system in accordance with that shownin FIG. 5 is illustrated as an example.

In this embodiment a moveable bath 50 is provided which has on itsbottom surface a megasonic transducer 20. The megasonic transducer 20 ofthe second embodiment may be larger than the megasonic transducer of thefirst embodiment because there are no particular size constraints. Thus,the distance between the megasonic transducer and the surface to becleaned (the bottom surface of the liquid confinement system) can bemade larger and up to 50 mm. In an embodiment, the distance is less than40 mm or less than 30 mm.

A controller controls the position of the bath 50 which is moveablebetween a store position and a cleaning position (as illustrated) andwhich controls the level of fluid in the bath 50. In one embodiment thelevel of liquid is controlled so as to cover the bottom surface of theliquid confinement system LCS but not to cover the final element of theprojection system PS. Thus, the gap 75 is not filled with liquid. Thisis to protect the final element of the projection system from the sonicwaves and/or the cleaning liquid which could damage it. Additionally oralternatively, a shield (perhaps in the form of a plate) may be used toshield the final element of the projection system from megasonic wavesand/or liquid. In an embodiment, this bath arrangement may be used toclean the final element of the projection system PS and in which casethe controller increases the level of liquid in the bath 50 so that thefinal element of the projection system PS is covered in liquid.

In the second embodiment illustrated in FIG. 7, the bath 50 and/ortransducer 20 may be moveable relative to the projection system PS inthe cleaning position and liquid confinement system LCS such that thewhole under surface of the liquid confinement system LCS may be cleaned.Of course, this need not be implemented if the transducer 20 is largeenough to clean the whole bottom surface of the liquid confinementsystem LCS (or just a desired portion thereof) without being moved.

In a third embodiment illustrated in FIG. 8, which is used to clean, forexample, the top surface of the substrate table WT, the substrate tableWT is provided with a retractable barrier 80 which, in its cleanposition extends above and around the top surface of the substrate tableWT to be cleaned. Once the barrier 80 has been raised to its cleaningposition liquid can be provided on the surface to be cleaned and amegasonic transducer 20 can be moved over the surface of the substratetable WT (with the bottom surface of the transducer 20 covered byliquid) and/or the substrate table WT may be moved under the transducer20, thereby to clean the top surface of the substrate table WT. Ofcourse a similar embodiment is possible where the barrier 80 is notretractable and is permanently attached to the substrate table WT or isa removable part. The transducer 20 could be fixed or moveable(particularly in the Z direction) and/or also moveable in the X/Y axisduring the cleaning operation.

When the top surface of the substrate table WT is cleaned, it is alsopossible to clean at the same time one or more sensors provided on thetop surface of the substrate table WT. Examples of types of sensorsinclude a transmission image sensor, a lens interferometer, and/or aspot sensor.

In an embodiment, it may be useful to ensure that the acoustic wavesproduced by the transducer impinge at 90° onto the surface to becleaned. For this purpose, a micrometer may be provided to adjust thetilt of the transducer 20 relative to the surface to be cleaned. In anembodiment, it may be advantageous to provide the transducer tiltedrelative to the surface and again, this can be adjusted using amicrometer. A micrometer may also be used to adjust the distance fromthe transducer to the surface to be cleaned. In all embodiments, a flowof liquid across the distance between the transducer and the surface tobe cleaned is desirable though not essential.

In an embodiment, there is provided an immersion lithographic projectionapparatus, comprising: a substrate table constructed and arranged tohold a substrate; a projection system configured to project a patternedbeam of radiation onto the substrate; a megasonic transducer configuredto clean a surface; and a liquid supply system constructed and arrangedto supply liquid between the megasonic transducer and the surface to becleaned.

In an embodiment, the megasonic transducer has a frequency of above 1MHz. In an embodiment, the liquid supply system comprises a barriermember which surrounds a lower end of the megasonic transducer and whichforms a seal between the barrier member and the surface to be cleaned,thereby to contain liquid between the megasonic transducer and thesurface to be cleaned. In an embodiment, the barrier member, thetransducer, or both, is moveable relative to the surface. In anembodiment, the contactless seal is a gas seal. In an embodiment, thesurface is a top surface of the substrate table. In an embodiment, theliquid supply system is constructed and arranged to provide a flow ofliquid over the surface. In an embodiment, the megasonic transducer ispositioned, in a cleaning mode, to face the surface such that sonicwaves are directed in a line of sight path to the surface to be cleaned.In an embodiment, the surface is a surface of the substrate table, asurface of a liquid confinement system constructed to provide liquidbetween the projection system and a substrate to be exposed, or both. Inan embodiment, the liquid supply system comprises a bath and acontroller configured to fill the bath with liquid to a certain level.In an embodiment, the megasonic transducer is positioned in a bottom ofthe bath to induce sonic waves, directed away from the bottom of thebath, in liquid in the bath. In an embodiment, the bath is moveable to acleaning position under the projection system and to at least partlyenclose a liquid confinement system constructed to provide, in use,liquid between the projection system and a substrate to be exposed, andthe certain level is below the bottom of the projection system but abovea bottom surface of the liquid confinement system. In an embodiment, theliquid supply system comprises a barrier which surrounds a top surfaceof the substrate table, such that liquid can be provided on the topsurface and be prevented from escaping by the barrier. In an embodiment,the barrier is moveable between a cleaning position and a non-cleaningposition. In an embodiment, the megasonic transducer is moveablerelative to the surface. In an embodiment, the apparatus furthercomprises a shield to shield an optical element of the projection systemfrom megasonic waves, liquid, or both. In an embodiment, the apparatusfurther comprises a gas supply configured to introduce gas into theliquid. In an embodiment, the gas is N₂, CO₂ or O₂. In an embodiment,the apparatus further comprises a surfactant supplier to supplysurfactant to the liquid.

In an embodiment, there is provided an immersion lithographic projectionapparatus, comprising: a substrate table constructed and arranged tohold a substrate; a projection system configured to project a patternedbeam of radiation onto the substrate; a megasonic transducer configuredto clean a surface, the megasonic transducer being moveable relative tothe surface such that, in a cleaning mode, a direct straight paththrough liquid exists between the megasonic transducer and the surface;and a liquid supply system configured to provide liquid between thetransducer and the surface.

In an embodiment, in the cleaning mode, the megasonic transducer and thesurface face each other at a distance of less than 50 mm. In anembodiment, in the cleaning mode, the megasonic transducer and thesurface face each other at a distance of less than 50 mm, and whereinthe surface is a surface of a liquid confinement system constructed toprovide liquid between the projection system and a substrate to beexposed. In an embodiment, the apparatus further comprises a gas supplyconfigured to introduce gas into the liquid. In an embodiment, the gasis N₂, CO₂ or O₂. In an embodiment, the apparatus further comprises asurfactant supplier configured to supply surfactant to the liquid.

In an embodiment, there is provided a method of cleaning a surface of animmersion lithographic projection apparatus, comprising: covering atleast a part of the surface to be cleaned in liquid; and introducingmegasonic waves into the liquid.

In an embodiment, the megasonic transducer has a frequency of aboveabout 750 kHz. In an embodiment, the megasonic waves are introducedusing a megasonic transducer and comprising moving the megasonictransducer relative to the surface to be cleaned. In an embodiment, themegasonic waves impinge perpendicularly to the surface to be cleaned. Inan embodiment, the megasonic waves impinge at an angle to the surface tobe cleaned. In an embodiment, the method comprises moving the liquidcovering at least part of the surface to be cleaned over the surface. Inan embodiment, the method comprises positioning a megasonic transducer,in a cleaning mode, to face the surface such that the megasonic wavesare directed in a line of sight path to the surface to be cleaned. In anembodiment, the method further comprises introducing gas into theliquid. In an embodiment, the method further comprises introducing asurfactant into the liquid.

Although specific reference may be made in this text to the use oflithographic apparatus in the manufacture of ICs, it should beunderstood that the lithographic apparatus described herein may haveother applications, such as the manufacture of integrated opticalsystems, guidance and detection patterns for magnetic domain memories,flat-panel displays, liquid-crystal displays (LCDs), thin-film magneticheads, etc. The skilled artisan will appreciate that, in the context ofsuch alternative applications, any use of the terms “wafer” or “die”herein may be considered as synonymous with the more general terms“substrate” or “target portion”, respectively. The substrate referred toherein may be processed, before or after exposure, in for example atrack (a tool that typically applies a layer of resist to a substrateand develops the exposed resist), a metrology tool and/or an inspectiontool. Where applicable, the disclosure herein may be applied to such andother substrate processing tools. Further, the substrate may beprocessed more than once, for example in order to create a multi-layerIC, so that the term substrate used herein may also refer to a substratethat already contains multiple processed layers.

The terms “radiation” and “beam” used herein encompass all types ofelectromagnetic radiation, including ultraviolet (UV) radiation (e.g.having a wavelength of or about 365, 248, 193, 157 or 126 nm).

The term “lens”, where the context allows, may refer to any one orcombination of various types of optical components, including refractiveand reflective optical components.

While specific embodiments of the invention have been described above,it will be appreciated that the invention may be practiced otherwisethan as described. For example, the invention may take the form of acomputer program containing one or more sequences of machine-readableinstructions describing a method as disclosed above, or a data storagemedium (e.g. semiconductor memory, magnetic or optical disk) having sucha computer program stored therein.

One or more embodiments of the invention may be applied to any immersionlithography apparatus, in particular, but not exclusively, those typesmentioned above and whether the immersion liquid is provided in the formof a bath or only on a localized surface area of the substrate. A liquidsupply system as contemplated herein should be broadly construed. Incertain embodiments, it may be a mechanism or combination of structuresthat provides a liquid to a space between the projection system and thesubstrate and/or substrate table. It may comprise a combination of oneor more structures, one or more liquid inlets, one or more gas inlets,one or more gas outlets, and/or one or more liquid outlets that provideliquid to the space. In an embodiment, a surface of the space may be aportion of the substrate and/or substrate table, or a surface of thespace may completely cover a surface of the substrate and/or substratetable, or the space may envelop the substrate and/or substrate table.The liquid supply system may optionally further include one or moreelements to control the position, quantity, quality, shape, flow rate orany other features of the liquid.

The immersion liquid used in the apparatus may have differentcompositions, according to the desired properties and the wavelength ofexposure radiation used. For an exposure wavelength of 193 nm, ultrapure water or water-based compositions may be used and for this reasonthe immersion liquid is sometimes referred to as water and water-relatedterms such as hydrophilic, hydrophobic, humidity, etc. may be used.

The descriptions above are intended to be illustrative, not limiting.Thus, it will be apparent to one skilled in the art that modificationsmay be made to the invention as described without departing from thescope of the claims set out below.

1.-20. (canceled)
 21. An immersion lithographic projection apparatus,comprising: a movable table; a projection system to project a patternedbeam of radiation onto the table, the projection system having anoptical element nearest the table; a liquid confinement systemconfigured to at least partly confine liquid between the optical elementand the table for exposure of a radiation-sensitive substrate; acleaning liquid supply system to provide a cleaning liquid to contactthe liquid confinement system; and a shield to prevent cleaning liquidfrom contacting a surface, nearest the table, of the optical element.22. The apparatus of claim 21, wherein the shield comprises asubstantially liquid-free gap adjacent the optical element surface andwherein the cleaning liquid supply system is configured to form the gapby controlling provision of cleaning liquid to a level that is below theoptical element surface but at or above a bottom surface of the liquidconfinement system.
 23. The apparatus of claim 21, wherein the shieldcomprises a plate.
 24. The apparatus of claim 21, further comprising atransducer configured to emit sonic waves to the cleaning liquid toclean a surface.
 25. The apparatus of claim 24, wherein the transduceris physically separate from the liquid confinement system and movablewith respect to the projection system, the liquid confinement system, orboth the projection system and the liquid confinement system.
 26. Theapparatus of claim 21, wherein the cleaning liquid supply systemcomprises a structure movable with respect to the liquid confinementsystem to provide the cleaning liquid to contact the liquid confinementsystem.
 27. The apparatus of claim 21, wherein the cleaning liquidsupply system comprises a movable structure having a recess toaccommodate cleaning liquid, the recess having an inner periphery widerthan an outer periphery of the liquid confinement system.
 28. A methodof cleaning a surface of a component of a lithographic projectionapparatus, the method comprising: providing a cleaning liquid to contacta liquid confinement structure, the liquid confinement structureconfigured to at least partly confine liquid between a movable table andan optical element, nearest the table, of a projection system of thelithographic projection apparatus for exposure of a radiation-sensitivesubstrate, the projection system configured to project a modulated beamof radiation onto the table; and preventing cleaning liquid fromcontacting a surface, nearest the table, of the optical element.
 29. Themethod of claim 28, wherein the preventing comprises controllingprovision of the cleaning liquid to a level that is below the opticalelement surface but at or above a bottom surface of the liquidconfinement structure.
 30. The method of claim 28, wherein thepreventing comprises interposing a plate between the optical elementsurface and the cleaning liquid.
 31. The method of claim 28, furthercomprising emitting sonic waves to the cleaning liquid to clean asurface.
 32. The method of claim 31, further comprising moving atransducer emitting the sonic waves with respect to the projectionsystem, the liquid confinement structure, or both the projection systemand the liquid confinement structure, the transducer being physicallyseparate from the liquid confinement structure.
 33. The method of claim28, comprising providing the cleaning liquid to contact the liquidconfinement structure using a structure movable with respect to theliquid confinement structure.
 34. The method of claim 28, comprisingproviding the cleaning liquid to contact the liquid confinementstructure using a movable structure having a recess to accommodatecleaning liquid, the recess having an inner periphery wider than anouter periphery of the liquid confinement structure.
 35. An immersionlithographic projection apparatus, comprising: a movable table; aprojection system to project a patterned beam of radiation onto thetable, the projection system having an optical element nearest thetable; a liquid confinement system configured to at least partly confineliquid between the optical element and the table for exposure of aradiation-sensitive substrate; and a cleaning liquid supply system toprovide a cleaning liquid to contact the liquid confinement system,wherein the apparatus is configured to prevent cleaning liquid fromcontacting a surface, nearest the table, of the optical element.
 36. Theapparatus of claim 35, further comprising a transducer configured toemit sonic waves to the cleaning liquid to clean a surface.
 37. Theapparatus of claim 36, wherein the transducer is physically separatefrom the liquid confinement system and movable with respect to theprojection system, the liquid confinement system, or both the projectionsystem and the liquid confinement system.
 38. The apparatus of claim 35,wherein the cleaning liquid supply system is configured to controlprovision of cleaning liquid to a level that is below the opticalelement surface such that the cleaning liquid is prevented fromcontacting the optical element surface.
 39. The apparatus of claim 35,wherein a plate is provided to prevent the cleaning liquid fromcontacting the optical element surface.
 40. The apparatus of claim 35,wherein the cleaning liquid supply system comprises a structure movablewith respect to the liquid confinement system to provide the cleaningliquid to contact the liquid confinement system.